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A titanium target refers to a piece of titanium or a titanium alloy used as the source material in sputtering or other physical vapor deposition (PVD) processes. These processes are employed to deposit thin films of titanium onto a substrate for various applications across industries such as electronics, aerospace, medical devices, and decorative coatings. Titanium targets are chosen for their unique properties, including high strength-to-weight ratio, excellent corrosion resistance, and biocompatibility.
High Purity: Titanium targets used in sputtering processes are often of high purity (typically 99.9% or higher) to ensure the quality of the thin film and to minimize the inclusion of impurities that could affect the film’s properties.
Corrosion Resistance: Titanium is highly resistant to corrosion by both water and chemical environments, making it an ideal choice for coatings that need to withstand harsh conditions.
Biocompatibility: Due to its excellent biocompatibility, titanium is often used for medical implants and devices. Sputtering with titanium targets is used to create coatings that are in direct contact with body tissues.
Strength-to-Weight Ratio: Titanium has one of the highest strength-to-weight ratios among metals, making it desirable for aerospace and automotive applications where reducing weight without sacrificing strength is crucial.
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