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A tantalum-niobium alloy known for its superior mechanical properties at elevated temperatures. It's frequently found in furnace construction, heat exchangers, and nuclear reactors due to its resistance to creep and oxidation.
Products | Size（mm） | Grade Nos | Specification |
Tantalum and Tantalum alloy targets | φ（50.8~550）×（1~28） | R05200, R05400 | ASTM B392-99 |
RO5255 (Ta10W) tantalum round target combines the excellent properties of tantalum with the added strength and higher melting point of tungsten, offering significant advantages for sputtering processes. This alloy’s enhanced durability and resistance to high-temperature deformation make it ideal for applications requiring prolonged service life under extreme conditions, such as in the aerospace and defense sectors. Its superior corrosion resistance ensures consistent performance and minimal contamination in aggressive chemical environments, crucial for high-purity thin film depositions in semiconductor and electronic device manufacturing. The addition of tungsten improves its mechanical strength, allowing for more stable sputtering rates and uniform film thicknesses, enhancing the overall quality of the coated products. The RO5255 tantalum round target is thus a top choice for industries demanding high performance and reliability.
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