This is a high-purity tantalum grade, typically used in applications requiring excellent corrosion resistance and biocompatibility, such as medical implants and chemical processing equipment.
Products | Size(mm) | Grade Nos | Specification |
Tantalum and Tantalum alloy targets | φ(50.8~550)×(1~28) | R05200, R05400 | ASTM B392-99 |
Tantalum sputtering targets provide superior thin film deposition properties due to their exceptional chemical resistance, high melting point, and low thermal conductivity. They ensure uniform coatings with excellent adhesion in demanding applications like semiconductor manufacturing, optics, and superconductors, where durability and purity are critical.
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