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An alloy of tantalum and tungsten, it boasts increased strength and hardness compared to pure tantalum. It's often utilized in aerospace components, defense systems, and high-temperature environments where durability is key.
Products | Size（mm） | Grade Nos | Specification |
Tantalum and Tantalum alloy targets | φ（50.8~550）×（1~28） | R05200, R05400 | ASTM B392-99 |
RO5400 tantalum round target is highly prized in the field of thin-film deposition and coating technologies, offering a suite of advantages that make it indispensable for high-tech applications. Its exceptional purity ensures high-quality film coatings, crucial for semiconductor, optical, and electronic devices, where even minor impurities can significantly affect performance. The material’s outstanding corrosion resistance extends the life of the target, reducing downtime and maintenance costs in sputtering processes. Additionally, RO5400’s high melting point and thermal stability enable consistent performance under the high-temperature conditions often encountered in coating applications. Its uniform grain structure contributes to consistent sputtering rates, ensuring uniform film thickness and quality. The combination of purity, durability, and performance stability under extreme conditions makes RO5400 tantalum round targets a preferred choice for advanced manufacturing processes.
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