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Another tantalum-niobium alloy, this grade offers improved ductility and weldability over other tantalum alloys. It's preferred in applications that require forming or welding while maintaining good corrosion resistance and high-temperature performance.
Products | Size（mm） | Grade Nos | Specification |
Tantalum and Tantalum alloy targets | φ（50.8~550）×（1~28） | R05200, R05400 | ASTM B392-99 |
RO5252 (Ta2.5W) tantalum round target, with its strategic blend of tantalum and 2.5% tungsten, offers a unique set of advantages for thin film deposition processes. This alloy’s composition enhances its mechanical strength and thermal stability, making it highly resistant to warping or deformation under the intense conditions of sputtering operations. Its exceptional corrosion resistance ensures minimal contamination, crucial for achieving high-purity coatings in semiconductor, optical, and electronic applications. The addition of tungsten not only improves its durability but also contributes to a more consistent sputtering rate, facilitating uniform film thickness and quality. The RO5252 tantalum round target is thus an excellent choice for applications demanding high performance, reliability, and longevity.
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