English
SEARCH
Tantalum sputtering targets are high purity tantalum materials designed for thin film deposition in advanced technologies. Their exceptional chemical inertness, heat resistance, and low thermal expansion ensure uniform coatings with superior adhesion and stability, making them indispensable in semiconductor manufacturing, optical coatings, and research applications where reliability and precision are paramount.
High Melting Point: Tantalum has a high melting point (about 3017°C or 5463°F), making it suitable for applications that require materials to withstand high temperatures without degrading.
Excellent Corrosion Resistance: Tantalum is highly resistant to corrosion by acids and is only attacked by hydrofluoric acid, acidic solutions containing fluoride ions, and free sulfur trioxide. This makes it ideal for use in the chemical processing industry and other environments where corrosion resistance is crucial.
High Density and Thermal Conductivity: With a high density and thermal conductivity, tantalum targets can help in achieving uniform thin films during the sputtering process, which is critical for the performance of semiconductors and other electronic components.
PHONE
ADDRESS
Gaoya Village Industrial Park, Banyu Town, Baoji City, Shaanxi Province, China
